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titanium metallization

См. также в других словарях:

  • Memristor — Type Passive Working principle Memristance Invented Leon Chua (1971) First production HP Labs (2008) Electronic symbol …   Wikipedia

  • Gas dynamic cold spray — is a coating deposition method developed in the mid 1980s in the Soviet Union in The Institute of Theoretical and Applied Mechanics by Papyrin and his team. The solid powders (1 to 50 micrometers in diameter) are accelerated in supersonic gas… …   Wikipedia

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  • Integrated circuit — Silicon chip redirects here. For the electronics magazine, see Silicon Chip. Integrated circuit from an EPROM memory microchip showing the memory blocks, the supporting circuitry and the fine silver wires which connect the integrated circuit die… …   Wikipedia

  • Barrier metal — A barrier metal is a material used in integrated circuits to chemically isolate semiconductors from soft metal interconnects, while maintaining an electrical connection between them. For instance, a layer of barrier metal must surround every… …   Wikipedia

  • Electroetching — is an etching process that involves the use of chemicals, along with the employment of direct electric current and is done by applying electrochemical etching solution to a material layer, preferably a metal layer, on a workpiece, in the presence …   Wikipedia

  • nanotechnology — /nan euh tek nol euh jee, nay neuh /, n. any technology on the scale of nanometers. [1987] * * * Manipulation of atoms, molecules, and materials to form structures on the scale of nanometres (billionths of a metre). These nanostructures typically …   Universalium

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